NDIR Analyzers

Process Sense™ Non-dispersive Infrared Chamber Clean Endpoint

Process Sense™ endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense™ is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). The Process Sense™ gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense™, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.

Features & Benefits:

  • Reduced chamber clean times
  • Reduced chamber clean cost
  • Minimum particle events
  • Reduced NF3 usage
  • Reduced power consumption
  • Increased wafer throughput of CVD tool
  • Accurate determination of chamber clean endpoint
  • Low-cost filter-based analyzer